Nearfield Instruments (NFI) is an innovative scale-up high-tech company focused on designing, developing, integrating, marketing, and servicing advanced metrology machines. Our cutting-edge machines empower the world's leading chipmakers to enhance production yields and functionality of microchips, resulting in smaller and more powerful consumer electronics. Founded in 2016, we have gathered approximately 320 talented professionals in science and technology to create a revolutionary high throughput Scanning Probe Microscopy system.

About The Job

As a Senior Application Engineer in Lithography and Optical Imaging, you will utilize your extensive background in lithography, EUV, and scanner performance optimization. Your expertise in optical imaging and lithography physics will be crucial in advancing our metrology and process control solutions.

Responsibilities

• Develop and optimize optical imaging models and techniques for advanced metrology and inspection.
• Translate scanner performance knowledge (CDU, focus, overlay, aberrations, imaging limits) into innovative process control solutions.
• Apply expertise in (High-NA) EUV mask characterization, including 3D feature metrology (absorber CD, sidewall angle, height) and resist behavior under EUV and out-of-band light exposure.
• Advance methods such as scatterometry and computational imaging to enhance in-line process control.
• Collaborate with system architects, AFM/imaging experts, and software engineers to integrate imaging innovations into our commercial systems.
• Work with leading global semiconductor fabs to validate and deploy solutions in high-volume manufacturing environments.

Requirements

• PhD or MSc in Physics, Optical Engineering, Electrical Engineering, or a related field.
• Deep expertise in optical imaging, EUV lithography, and scanner performance optimization.
• Proven experience in EUV mask, scatterometry, and resist characterization.
• Ability to bridge lithography knowledge with metrology and process control applications.
• 5+ years of industry or advanced academic research experience in semiconductor lithography, optical metrology, or related domains.
• Strong analytical and problem-solving skills, with the ability to work across disciplines in a fast-paced R&D environment.