This experiment-oriented postdoctoral role bridges fundamental physics and industrial applications, situated within ARCNL’s Source Department. The research aims to achieve an atomic and molecular-level understanding of the dynamics involved in contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography. Our group has made significant discoveries, such as uncovering the quantum origins of generated EUV light, establishing a universal law for expanding plasma, and investigating the behavior of tin droplets in EUV sources. We are now exploring the next generation of light sources to enhance energy efficiency and power.

The Role

In this position, you will work on identifying optimal plasma conditions for light production and the necessary laser technology. Collaborating with a team of PhD students and postdocs, you will design and execute experiments while utilizing advanced laser technologies to investigate light and ion emission from generated plasma.

Qualifications

• A PhD in (Applied) Physics or imminent completion.
• Knowledge of experimental laser and/or plasma physics is advantageous, especially with strong laboratory skills.
• Programming experience, particularly in Python, is a plus.
• Strong verbal and written communication skills in English are essential.

Work Environment

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry of key technologies in nanolithography, primarily for the semiconductor industry. A public-private partnership involving NWO, UvA, VU, UG, and ASML, ARCNL is located at the Amsterdam Science Park and comprises around 100 scientists and support staff.

Working Conditions

This full-time position (40 hours/week) is offered for up to 3 years under the Netherlands Foundation for Scientific Research Institutes (NWO-I), with a starting salary of €4,552 gross per month, scale 10, along with various employment benefits. Non-Dutch applicants may benefit from a favorable tax agreement, and ARCNL provides assistance with housing and visa applications.

For more information about the position, please contact Dr. Oscar Versolato, Group Leader EUV Plasma Processes, at versolato@arcnl.nl or +31 (0)20-851 7100.

Application

To apply, submit your resume and a motivation letter (max. 1 page) online. Online screening may be part of the selection process.

Diversity Code

ARCNL is committed to fostering an inclusive and diverse work environment, welcoming candidates from various backgrounds and cultures. We encourage applications from individuals with the right qualifications, regardless of age, gender, origin, sexual orientation, or physical ability. Commercial inquiries in response to this advertisement are not appreciated.